GR9 Titanium Raw Material Vacuum Coating Target Chrome Zirconium Target PVD

GR9 Titanium Raw Material Vacuum Coating Target Chrome Zirconium Target PVD

Our sputtering targets are available in a comprehensive range of compositions, purity levels, shapes and dimensions. For instance, the most common forms of targets including round, rectangular, ring and tube. They are in single or multiple sections construction depending on the size of the target and the properties of the material. We can customise to suit your needs.

We usually adopt Vacuum Melting or Hot Isostatic Pressing (HIP) to produce metal&alloy targets and Hot Pressed Sintering for ceramic targets. We choose the appropriate production process to manufacture the products to meet your specific application requirements.

Application:

Sputtering is a process whereby atoms are ejected from a solid target material due to the bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition. Titanium sputtering target is used for CD-ROM, decoration, flat panel displays, functional coating as nicely as other optical information storage space industry, glass coating industry like car glass and architectural glass, optical communication, etc.

Products Show:

Packaging:

Our titanium targets are carefully handled to prevent damage during storage and transportation and to preserve the quality of our products in their original condition.Sealed in plastic, wrapped in foam to protect, and ends capped to protect seal surfaces.